Motion Control – Yaw and Pitch Stages

Van Nuys, CA – Motion Control – Eight new Yaw-and-Pitch Stages have been introduced by OES (Optimal Engineering Systems, Inc.). These new series of high precision Yaw-and-Pitch Stages integrate Goniometers as the lower stage (yaw axis) and a rotary stage as the upper stage (pitch axis). The yaw range of travel is +/-10 or +/- 15 degrees. The pitch range of travel is 360 degrees of continuous motion. The diameter of the pitch axis is 60 mm.

Applications include Laser scanning, drilling, and machining, reverse engineering, inspection, assembly, measurements, tracking, and positioning.